KOREAN MANUFACTURING. GLOBAL POSSIBILITIES.PUBLIC REVIEW VERSION · 2026-11-03
New Power Plasma · PRODUCT & SPECIFICATIONS

Remote Plasma Generator for semiconductor cleaning

Remote plasma source families for CVD chamber cleaning; the published table separates semiconductor and display configurations.

Specifications · Remote Plasma Generator for semiconductor cleaning
ParameterSpecification
Semiconductor NF3 flow and power combinations6, 7, 8 or 9 slm at 10 kW; 14 slm at 15 kW
Display NF3 flow and power combinations36 slm at 18/20 kW; 45 slm at 22 kW; 60 slm at 30 kW

Who manufactures Remote Plasma Generator for semiconductor cleaning?

New Power Plasma presents this product in its official catalog. Review the linked source and confirm the current model, configuration, manufacturing site and supply terms for your order.

How do I confirm the right specification?

Compare your application against the published parameters above. Share the required dimensions, materials, performance conditions, quantity and destination with Prospera. A published range does not confirm that every configuration is available.

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Official source

New Power Plasma product information ↗.

Independent sourcing information supported by Prospera. Specifications describe the reviewed source, not a guaranteed quotation or certification for your project.

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